News Release

As communications systems become more sophisticated and faster, semiconductor circuit patterns are becoming increasingly finer. With the improved performance of the extreme ultraviolet (EUV) lithography systems used to form fine circuits, the development of more durable pellicles becomes vital. Pellicles are components that act as anti-dust membrane to prevent foreign matter from adhering to photo-masks (original plates of circuits). These components, which must be transparent, heat resistant, and durable enough for the EUV used to form circuits as fine as five nanometers (one-billionth of a meter) or less, contribute to greater semiconductor productivity.

While conventional pellicles have been made of polysilicon and other materials, pellicles made of carbon nanotubes (CNTs: tubular carbon molecules) have recently been attracting attention as new, more durable materials have become necessary. The LINTEC Group has been exploring new applications for CNTs for some time at its Nano-Science & Technology Center (NSTC), located in the U.S. state of Texas, which has been working on developing CNT sheets. As part of this focus, the Center began to develop CNT pellicles in 2018 and has now successfully established a higher level of elemental technology.